Background and Objective: Marginal accuracy is considered as a fundamental aspect in the success and longevity of indirect
restoration. The aim of present study was to compare shoulder & chamfer finish line designs on marginal adaptation of IPS e.max
Press and IPS e.max ZirCAD restorations. Materials and methods: An extracted intact maxillary first premolar tooth was selected for
the study. A chamfer finish line design (50°, 0.8 mm deep) was prepared using a cylinder round end diamond bur and impression
was taken using polyvinyl siloxane impression material and a cast was fabricated. The impression process was repeated 20 times
with the same coping. The 50 °chamfer margin then turned to 90° shoulder margin (1 mm deep). Resin dies were prepared and
impressions of each epoxy resin die were made and poured with stone die. A total 20 IPS e.max Press and 20 IPS e.max ZirCAD were
made on the stone dies and the marginal gap was assessed using scanning electron microscope (SEM). Data were analyzed using
two-way ANOVA, SPSS ver, 19. Results: The marginal gap in chamfer ZirCAD was 21±43.54μ and in chamfer Press was 9±50.77μ and
the marginal gap in shoulder ZirCAD was 21±67.12μ and in chamfer Press was 25±95.97μ. The differences were statistically
significant (P<0.05). Conclusion: Marginal adaptation in chamfer finish line is preferred than shoulder finish line (P=0.000), as well as
ZirCAD restoration produces a good marginal adaptation than Press restoration (P=0.011). The marginal gaps achieved by the
restorations (<120 microns) is clinically acceptable.
Keywords: Finish Line Designs, Marginal Adaptation, Restorations